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1. W. T. Lai, P. H. Liao, A. P. Homyk, A. Scherer, and P.
W. Li, 2012, ¡§SiGe
quantum dots on Si pillars for visible to near-infrared photodetection,¡¨ submitted to IEEE Photonic Technology Lett.
2. M. T. Hung, C. C. Wang, J. Y. Chiou, J. C. Hsu, S. W. Lee, T. M. Hsu, P. W. Li, 2012, ¡§Large
reduction in thermal conductivity for Ge quantum dots
embedded in SiO2 system,¡¨ Applied
Physics Letters (in press).
3. M. H. Kuo, C. C.
Wang, W. T. Lai, Tom George, and P. W. Li, 2012, ¡§Designer Ge quantum dots on Si: A heterostructure configuration with enhanced optoelectronic
performance,¡¨ Applied Physics Letters, vol. 101,
223107. ¡VIEDMS, Best Poster Award
4. I. H. Chen, K.
H. Chen, D. M. T. Kuo, and P. W. Li, 2012, ¡§Single Ge quantum
dot placement along with self-aligned electrodes for effective management of
single charge tunneling,¡¨ IEEE Trans. Electron Devices, vol. 59, p. 3224. SCI/0
5. C. Y. Chien, J.
W. Hsu, P. C. Chiu, J. I. Chyi, and P. W. Li, 2012, ¡§Gate stack engineering
and thermal treatment on electrical and interfacial properties of Ti/Pt/HfO2/InAs pMOS capacitors,¡¨ Active and Passive Electronic
Components (in press). EI
6. C. C. Wang, K. H. Chen, I. H. Chen, H. T. Chang, W. Y. Chen,
J. C. Hsu, S. W. Lee, T. M. Hsu, M. T. Hung, and P. W. Li,
2012, ¡§CMOS-compatible
generation of self-organized 3D Ge quantum dot array
for photonic and thermoelectric applications,¡¨ IEEE
Trans. Nanotechnology, vol. 11, no. 4, p. 657-660. SCI/1
7. J. E. Chang, P. H. Liao,
C. Y. Chien, J. C. Hsu, M. T. Hung, S. W. Lee, W. Y. Chen, T. M. Hsu, T.
George, and P. W. Li, 2012, ¡§Matrix and quantum
confinement effects on optical and thermal properties of Ge
quantum dots,¡¨ Journal of Physics D:
Applied Physics, vol. 45, 15303. SCI/2
8. C. Y. Chien, Y.
J. Chang, K. H. Chen, W. T. Lai, T. George, A. Scherer, and P. W. Li, 2011, ¡§Nanoscale,
catalytically-enhanced
local oxidation of silicon-containing layers by ¡§burrowing¡¨ Ge
quantum dots,¡¨ Nanotechnology, vol. 22, p. 435602.
SCI/3
9. Edward S Yang, Pei-Wen Li, Bernd Nilius, and Geng Li, 2011, ¡§Ancient Chinese medicine and mechanistic
evidence of acupuncture physiology,¡¨ Pflugers Archiv-European Journal of Physiology, vol. 462, p.
645-653. SCI/2
10.Geng Li, Jieming
Liang, Pei-Wen
Li, Xiaoqiang Yao, Peter Zhong
Pei, Wei Li, Qi-Hua He, Xifei
Yang, Queenie CC Chan, Paul YS Cheung, Qi Yuan Ma, Siu
Kam Lam, Patrick YC Cheng, Edward
S. Yang, 2011, ¡¨Physiology and
cell biology of
acupuncture observed in calcium signaling activated by acoustic shear wave,¡¨ Pflugers Archiv-European
Journal of Physiology, vol. 462, p. 587-597. SCI/2
11.K. H. Chen, C. Y. Chien,
W. T. Lai, T. George, A. Scherer, and Pei-Wen Li, 2011, ¡§Controlled
heterogeneous nucleation and growth of germanium quantum dots on nano-patterned silicon dioxide and silicon nitride
substrates,¡¨ Journal of Crystal Growth & Design, vol. 11, p. 3222-3226. DOI: 10.1021/cg200470f. SCI/2
12.W. T. Lai, C. W. Wu, C. C.
Lin, and P. W. Li, 2011, ¡§Analysis
of carrier transport in tri-gate Si nanowire MOSFETs,¡¨ IEEE
Trans. Electron Devices, vol. 58, p. 1336-1343. SCI
13.Hsing-Wang Tsai, Zing-Way Pei, Ting-Hsiang
Huang, Pei-Wen
Li, Yi-Jen Chan, 2011, ¡§Anode engineering in a polymer solar cell and applied on plastic
substrate,¡¨ Solar Energy Materials and Solar Cells, vol.
95, p. 611 SCI
14.C. Y. Chien, Y.
R. Chang, R. N. Chang, M. S. Lee, W. Y. Chen, T. M. Hsu, and P. W. Li, 2010, ¡§Formation of Ge quantum dots array in layer-cake technique for advanced photovolatics,¡¨ Nanotechnology,
vol. 21, p. 505201 SCI/3
15.Po-Yuan Lo, Pei-Wen Li, and Yi-Jen Chan, 2010,
¡§Stability improvement of
organic thin-film transistors using stacked gate dielectrics,¡¨ IEEE Trans. Electron Devices, vol. 57, p. 3131. SCI
16.Hsing-Wang Tsai, Zing-Way Pei, Ting-Hsiang
Huang, Pei-Wen
Li, Yi-Jen Chan, 2010, ¡§A conductor/insulator/semiconductor polymer solar cell by an ultra-thin polymer insulator,¡¨ Organic Electronics, vol. 11, p. 1796¡V1801, SCI/3
17.H. K. Lin,
D. W. Fan, Y. C. Lin, P. C. Chiu, C. Y. Chien, P. W. Li, J. I. Chyi, C. H. Ko, T M. Kuan, M. K. Hsieh, W. C. Lee, C. H. Wann,
2010, ¡§E-beam-evaporated
Al2O3 for InAs/AlSb metal¡Voxide¡Vsemiconductor HEMT development,¡¨ Solid-State
Electronics, vol. 54, p. 505. SCI/7
18.K. H. Chen, C. Y. Chien,
and P. W. Li, 2010, ¡§Precise Ge quantum dot placement for quantum tunneling devices,¡¨ Nanotechnology, vol. 21, 055302. SCI/11
19.I. H. Chen, S. S. Tseng, and P. W. Li, 2009, ¡§Thermal stability of
germanium quantum dots phototransistors for near ultra-violet applications,¡¨ IEEE Photonics Technology Letters, vol. 21, p. 1674. SCI/0
20.J. R. Chen, H. T. Lin, G. W. Hwang, Y. J.
Chan and P. W. Li, 2009, ¡§Temperature-dependent
physical and electrical characteristics of polymer/RAFT-polymer stabilized
nanoparticles system for organic nonvolatile memory,¡¨ Nanotechnology, vol. 20, 255706. SCI/7
21.P. Y. Lo, P. W. Li, Z. W. Pei, J. Hou, and
Y. J. Chan, 2009, ¡§Enhanced
P3HT OTFT transport performance using double gate modulation scheme,¡¨ IEEE Electron Device Letters, vol. 30, 629. SCI/5
22.W. T. Lai, D. M. T. Kuo,
and P. W. Li, 2009, ¡§Transient current through
a single germanium quantum dot at room temperature¡¨, Physica E, vol. 41, 886-889.
SCI/7
23.S. S. Tseng,
24.S. S. Tzeng and P. W. Li, 2008, ¡§Enhanced
400-600 nm photoresponsivity of metal-oxide- semiconductor diodes with
multi-stack germanium quantum dots,¡¨ Nanotechnology,
vol. 19, 235203. SCI/7
25.G. L. Chen, D. M. T. Kuo,
W. T. Lai, and P. W. Li,
2007, ¡§Tunneling
spectroscopy of germanium quantum-dot in single-hole transistors with
self-aligned electrodes,¡¨ Nanotechnology, vol. 18, p.
475402. SCI/10
26.T. -H. Lee, C. -H. Huang, Y. -Y. Yang, T. Suryasindhu, and P.
W. Li, 2007, ¡§Nanoscale thick
layer transfer of hydrogen-implanted wafer by using polycrystalline silicon
sacrificial layer,¡¨ Applied Physics Letters, vol. 91, p.203119. SCI/1
27.T. -H. Lee, Y. -Y. Yang, C. -H. Huang, P. W. Li, and T. Suryasindhu, 2007, ¡§Fabrication of a nano-scale single
crystalline silicon thin film on insulator,¡¨
Electrochemical and Solid-State Letters, vol. 10, K17-19. SCI
28.S. Maikap, P. J. Tzeng, C. H. Lin, T. Y. Wang, H. Y. Lee, S. S. Tzeng, C. C. Wang, T. C. Tien, L.
S. Lee, P. W. Li, J. R. Yang and M. J. Tsai, 2007, ¡§TiN nanocrystal flash memory devices,¡¨ International Journal of Nanomanufacturing,
vol. 2, no. 5, p. 407-419. (invited paper) (EI)
29.W. T. Lai and P. W. Li, 2007, ¡§Growth kinetics and related physical/electrical
properties of Ge quantum-dots formed by thermal
oxidation of Si1-xGex-on-insulator,¡¨ Nanotechnology, vol. 18,
p. 145402. (SCI, IF : 3.5)
30.Y. C. Hsu, W. T. Lai, P. W. Li, and D. M. T. Kuo,
2007, ¡§Room-temperature observation of current bistability and fine structures in germanium quantum
dots/SiO2 resonant tunne
31.J. H. Wu and P. W. Li, 2007, ¡§Ge nanocrystals metal-oxide-semiconductor transistors with Ge nanocrystals formed by thermal
oxidation of poly-Si0.88Ge0.12,¡¨ Semiconductor Science and Technology, vol. 22, p. S89-S92. (SCI, IF
: 1.6)
32.P. W. Li, M. T. Kuo, and Y. C. Hsu, 2006, ¡§Photo-excitation
effects on carrier transports in Germanium quantum dot resonant tunneling
diodes,¡¨ Applied
Physics Letters, vol. 89, p.133105. (SCI, IF :
4.2)
33.P. W. Li, M. T. Kuo, W. M. Liao, and W. T. Lai, 2006, ¡§Study of tunne
Also selected for the June 12, 2006 issue
of Virtual Journal of Nanoscale Science &
Technology.
34.W. M. Liao, P. W. Li, M. T. Kuo and W. T.
Lai, 2006, ¡§Room-temperature transient carrier transports in germanium
single-electron/-hole transistors,¡¨ Applied Physics
Letters, vol. 88, p. 182109. (SCI,
IF : 4.2)
Also
selected for the May 22, 2006 issue of Virtual Journal of Nanoscale
Science & Technology.
35.M. T. Kuo and P. W. Li, 2006, ¡§Interdot Coulomb repulsion effect on the charge
transport of parallel double single electron transistors,¡¨ Jpn.
J. Appl. Physics, vol. 45, no.
36.Huang, C.H.; Chang,
C.L.; Yang, Y.Y.; Suryasindhu, T.; Liao, W.-C.; Su,
Y.-H.; Li, P.W.; Liu, C.-Y.; Lai, C.S.; Ting, J.-H.; Chu, C.S.; Lee, C.-S.;
Lee, T.-H., 2006, ¡§Nanothick layer transfer of
hydrogen-implanted wafer using polysilicon
sacrificial layer,¡¨ Materials Research
Society Symposium Proceedings, v
921, p 84-89. (EI)
37.S. S. Liu, P. W. Li, W. H. Lan, and W. J.
Lin, 2006, ¡§The improvement of GaN p-i-n UV sensor by 8-pairs AlGaN/GaN superlattices structure,¡¨ Material
Science and Engineering B Solid State Materials For Advanced Technology, vol.
124, no. 1, p. 33-36. (SCI, IF : 1.6)
38.W. M. Liao and
P. W. Li, 2005, ¡§Temperature stability of SiGe dynamic threshold-voltgae MOSFETs,¡¨
Japanese Journal of Applied
Physics, vol. 44, no. 12, p.8453-8455.
(SCI, IF : 1.28)
39.S. S. Liu, P. W. Li, W. H. Lan, and W. J.
Lin, 2005, ¡§Improvements of AlGaN/GaN p-i-n UV sensors with graded AlGaN Layer
for the UV-B (280-320 nm) detection,¡¨ Material Science and Engineering B Solid
State Materials For Advanced Technology, vol. 122, no. 9, p. 196-200. (SCI, IF
: 1.6)
40.M. T. Kuo and P. W. Li, 2005, ¡§Tunneling current through a single
Germanium quantum dot,¡¨ Japanese Journal of Applied Physics, vol.
44, no. 9A, p.6429-6434. (SCI, IF :
1.28)
41.S. S. Liu, P. W. Li, and W. J. Lin, 2005, ¡§The improvements of GaN p-i-n UV sensor on 10
off-axis sapphire substrate,¡¨ Material
Science and Engineering B Solid State Materials For Advanced Technology,
vol. 121, no. 7, p. 85-91. (SCI, IF : 1.6)
42.S. S. Liu, P. W. Li, W. H. Lan, and W. J.
Lin, 2005, ¡§High temperature high humidity and
electrical static discharge stress effects on GaN PIN
UV sensor,¡¨ Material Science
and Engineering B Solid State Materials For Advanced Technology, vol. 121, no.
7, p. 29-33. (SCI, IF : 1.6)
43.P. W. Li, W. M. Liao,
M. T. Kuo, S. S. Tseng, P. S. Chen, and M. ¡VJ. Tsai, 2004, ¡§Optical and electronic properties of Ge quantum dots formed by
selective oxidation of SiGe/Si-on-Insulator,¡¨ Japanese Journal of
Applied Physics, vol. 43, no. 11 A, p. 7788-7792. (SCI, IF : 1.28)
44.P. W. Li, W. M. Liao,
M. T. Kuo, S. W. Lin, P. S. Chen, S. C. Lu, and M. ¡VJ. Tsai, 2004, ¡§Fabrication
of a germanium quantum-dot single electron transistor with large
Coulomb-blockade oscillations at room temperatures,¡¨ Applied Physics Letters,
vol. 85, p. 1532. (SCI, IF : 4.3)
Also selected for the Sep. 13, 2004 issue
of Virtual Journal of Nanoscale Science &
Technology.
45.P. W. Li, W. M. Liao,
S. W. Lin, P. S. Chen, S. C. Lu, and M. ¡VJ. Tsai, 2003, ¡§Formation of
atomic-scale Germanium quantum dots by selective oxidation of SiGe/Si-on-Insulator,¡¨ Apply Physics Letters, vol. 83, p.4628-4630. (SCI, IF : 4.3)
Also
selected for the December 8, 2003 issue of Virtual Journal of Nanoscale Science & Technology.
46.P. W. Li, W. M., Liao,
C. C. Shih, T. S. Kuo, L. S. Lai, Y. T. Tseng, and
M. ¡VJ. Tsai, 2003, ¡§Effect of substrate biasing on Si/SiGe heterostructure MOSFETs for low power circuit applications,¡¨ IEEE Electron Device Letters, vol. 24, no. 7, p.454-456. SCI, IF :
2.7)
47.Y. S. Huang,
C. J. Lin, C. H. Wang, N. Y. Li, C. C. Fan, and P. W. Li, 2003, ¡§Photoreflectance and surface
photovoltage spectroscopy characteristics of an InGaP/InGaAsN/GaAs NPN DHBT
structure,¡¨ IEE Proceedings-Optoelectronics, vol. 150,
no. 1, p. 99-101. (SCI,
IF : 1.2)
48.P. W. Li, W. M., Liao,
C. C. Shih, T. S. Kuo, L. S. Lai, Y. T. Tseng, and
M. ¡VJ. Tsai, 2003, ¡§High performance Si/SiGe heterostructure MOSFETs for low power analog circuit
applications,¡¨ Solid-State Electronics, vol. 47, no. 6,
p. 1095-1098. (SCI, IF : 1.2)
49.P. W. Li and W. M.
Liao, 2002, ¡§Low-frequency noise analysis of Si/SiGe channel pMOSFETs,¡¨ Solid-State Electronics,
vol. 46, no. 12, p. 2281-2285. (SCI, IF : 1.2)
50.P. W. Li and W. M.
Liao, 2002, ¡§Design of high speed Si/SiGe heterojunction complementary MOSFETs
with reduced short-channel effects,¡¨ Journal of Vacuum
Science and Technology A, vol. 20, p.1030-1033. (SCI, IF : 1.6)
51.P. W. Li and W. M.
Liao, 2002, ¡§Analysis of Si/SiGe channel pMOSFETs for deep-submicron scaling¡¨, Solid State Electronics, vol. 46, p.39-44. (SCI, IF : 1.2)
52.J. S. Liang, Y.
S. Huang, C. W. Tien, Y. M. Chang, C. W. Chen, N. Y.
Li, and P. W. Li, 2001, ¡§Surface
photovoltage spectroscopy characterization of a GaAs/GaAlAs vertical cavity
surface emitting laser structure: angle dependence,¡¨ Apply Physics Letters,
vol. 79, no. 20, p.3227-3229. (SCI, IF : 4.3)
53.C. J. Lin, Y. S. Huang, N. Y. Li, P. W. Li and K. K. Tiong, 2001, "Polarized-photoreflectance
characterization of an InGaP/InGaAsN/GaAs NpN double-heterojunction bipolar transistor structure", Journal
of Applied Physics, Vol. 90, p.4565-4569. (SCI, IF : 2.1)
54.P. W.
Li, H.
C. Guang, and N. Y. Li, 2000, ¡§Ellipsometric study of the optical properties of InGaAsN
layers,¡¨ Japanese Journal Applied Physics, vol.39,
no.9AB, pp. L898-900. (SCI, IF : 1.28)
55.P. W.
Li, N.
Y. Li, and Q. Hong, 2000, ¡§Effects of ex-situ annealing on electrical characteristics of p-n-p AlGaAs/InGaAsN/GaAs double heterojunction
bipolar transistors,¡¨ Solid-State Electronics, vol.44,
pp.1169-1172. (SCI, IF : 1.2)
56.N. Y. Li, C.
P. Hains, K. Yang, J. Lu, P. W. Li,
and J. Cheng, 1999, ¡§Organometallic vapor phase
epitaxy growth and optical characteristics of almost 1.2 ƒÝm GaInNAs three-quantum-well laser diodes¡¨,
Apply Physics Letters, vol. 75, p.1051-1053. (SCI, IF : 4.6)
57.S. W. Chan, L.
Zhao, C. Chen, P. W. Li, and
E. S. Yang, 1995, ¡§High performance
oxide on SiGe and the interface,¡¨ Microscopy of Semiconducting Materials,
Institute of Physics Conference series 146: 491-494. (SCI, IF : 1.0)
58.P. W. Li, E. S. Yang,
Y. F. Yang, and X. Li, 1995, Eletron Cyclotron resonance Microwave Plasma
Enhanced SiGe Oxidation and MOS Transistors, Inst. Phys. Conf., No. 141, Chap 6, p. 711-716. (SCI, IF : 1.0)
59.P. W. Li, E. S. Yang,
Y. F. Yang, J. Chu, and B. S. Meyerson, 1994, ¡§SiGe pMOSFETs with gate oxide
fabricated by microwave electron cyclotron resonance plasma¡¨, IEEE Electron Device Letters, vol. 15, p.402-405. (SCI, IF : 2.7)
60.P. W. Li and E. S.
Yang, 1993, ¡§SiGe gate-oxide prepared at low-temperatures in an electron cyclotron
resonance plasma¡¨, Apply Physics Letters, vol.
63, p.2938-2940. (SCI,
IF : 4.6)
61.P. W. Li, H. K. Liou,
E. S. Yang, S. S. Iyer, T. P. Smith III, and Z. Lu, 1992, ¡§Formation of Stoichiometric SiGe Oxide by Electron Cyclotron
Resonance Plasma¡¨, Apply Physics Letters, vol. 60, p.3265- 3267. (SCI, IF : 4.6)
62.P. W. Li, Q. Wang, and
E. S. Yang, 1992, ¡§Chemical and Electrical Characterization of AlGaAs/GaAs
Heterojunction Bipolar Transistors Treated by Electron Cyclotron Resonance
Plasma,¡¨ Apply Physics Letters, vol. 60, p.1996-1998. (SCI, IF : 4.6)
63.Q. Wang, E. S.
Yang, P. W. Li, Z. Lu, R. M.
Osgood, and W. I. Wang, 1992, ¡§Electron Cyclotron Resonance
Hydrogen and Nitrogen Plasma Surface Passivation of AlGaAs/GaAs Heterojunction
Bipolar Transistors¡¨, IEEE Electron Device Letters, vo.
13, p.83-85. (SCI,
IF : 2.7)
1.
P. W. Li, (Invited
talk) 2013, ¡§Designer Ge quantum-dot channel
transistors,¡¨ 2013 Collaborative Conference on
Materials Research, Jeju, Korea.
2.
P. W. Li, (Invited
talk) 2012, ¡§Designer Ge quantum dots on Si-containing
layers for Nanoelectronic and Nanophotonic
Devices¡¨, 2nd International conference on Small
Science, Orlando, FL, USA (Dec. 16-19).
3.
P. W. Li, (Invited
talk) 2012, ¡§CMOS-compatible precise placement of Ge quantum dots for
nanoelectronic, nanophotonic, and energy conversion devices¡§, 222nd Rim Pacific ECS Meeting -
Honolulu, Hawaii, (Oct. 7-12)
4.
C. Y. Chien, Y. J. Chang, and P. W. Li, ¡§Wavelength
Tunable Germanium Quantum-Dot Visible Photodetectors,¡¨ 2012 IEDMS
Kaohsiung, Taiwan. (Nov 29-30, 2012)
5.
M. H. Kuo,
C. C Wang, W. T. Lai, Tom George, and P.
W. Li, ¡§Designer Ge QDs on Si for Enhanced Near Infrared Photodetection,¡¨ 2012 IEDMS
Kaohsiung, Taiwan. (Nov 29-30, 2012)- IEDMS, Best Poster Award
6.
K. H. Chen, C. C. Wang, W. T.
Lai, C. Y. Chien, Tom George and P. W. Li, ¡§Evolution of Germanium Quantum
Dots Migration in Si-bearing Layer Mediated by Local Oxidation,¡¨ 2012 IEDMS
Kaohsiung, Taiwan. (Nov 29-30, 2012)
7.
C. C. Wang, J. Y. Chiou, J. C. Hsu, M. T. Hung, and P. W Li, ¡§Thermal and electrical properties of nano-scale
Si1-xGex pillars,¡¨ 2012 IEDMS Kaohsiung,
Taiwan. (Nov 29-30, 2012)
8. T. C. Hsu, K. H. Chen, C. Y. Chien, I. H. Chen, C. C. Wang, Tom George, and P. W. Li,
¡§A Novel Ge/Si and
Ge/SiO2 Interface Engineering for
Metal-Oxide-Semiconductor Configuration,¡¨ 2012 IEDMS Kaohsiung, Taiwan. (Nov 29-30, 2012)
9. I. H. Chen, K. H. Chen, and P. W. Li,
¡§Hole tunneling
spectroscopy of quantum states in Ge quantum dot,¡¨ 2012 IEDMS Kaohsiung, Taiwan. (Nov 29-30, 2012)
10. Y. Y. Hsiao, I. H. Chen, and P. W. Li, ¡§Geometry and
morphology effects on electrical resistivity and stability of NiSi nanowires,¡¨ 2012 IEDMS
Kaohsiung,
Taiwan. (Nov 29-30, 2012)
11. K.-H. Chen, I.-H.
Chen, C.-Y. Chien, C.-C. Wang, T. George and P.-W. Li, ¡§Evolution of
Germanium quantum dots migration in Si bearing layer mediated by thermal oxidation¡¨, 2012, 222nd Rim
Pacific ECS Meeting - Honolulu, Hawaii, (Oct. 7-12).
12.
I. H.Chen , K.H
Chen, M.T. Kuo, and P.W. Li, 2012, ¡§Placement of single Ge quantum dot along with self-aligned electrodes for
effective single hole tunneling¡¨ 2012 International
Conference on Solid-State Devices and Materials, Kyoto (Sep.25-27).
13.
C.C. Wang , J.Y. Chiou,
J.C. Hsu M.T Hung, H.T Chang and P.W.
Li, 2012, ¡§Quantum size effects on phonon transport in Ge
quantum dot/SiO2 system,¡§ 2012 International
Conference on Solid-State Devices and Materials, Kyoto Japan (Sep.25-27).
14.
W.T. Lai, P.H. Liao, A. Homyk,
A. Scherer and P.W. Li, 2012,
¡¨SiGe quantum dots on Si pillars for
visible photodetection¡¨ 2012
International Conference on Solid-State Devices and Materials, Kyoto Japan( Sep.25-27).
15.
Ching-Chi Wang, Kuan-Hung
Chen, Inn-Hao Chen, Wen-Yen Chen, Tzu-Min Hsu,
and Pei-Wen
Li, ¡§Fabrication of thin-film-like three-dimensional Ge
quantum dots pillar array for energy harvest/conversion applications,¡¨ Materials Research Society Spring Meeting Symposia, 2012.
16.
I. H. Chen, K. H. Chen, C. C. Wang, and P. W. Li, ¡§CMOS-Compatible Precise
Placement of Ge Quantum Dots for Nanoelectronic,
Nanophotonic, and Energy Conversion Devices,¡¨ 2012 Pacific rim Meeting on Electrochemical and Solid-state
Science, Honolulu, Hawaii, USA. (NSC 100-2120-M-008-004 and
99-2221-E-008-095-MY3).
17.
I. H. Chen, K. H. Chen, and P. W. Li, ¡§Single Ge quantum dot placement along with
self-aligned electrodes for effectivemanagement of
single electron tunneling,¡¨
2012 Silicon Nanoelectronics Workshop, Honolulu,
Hawaii, USA. (NSC 100-2120-M-008-004 and 99-2221-E-008-095-MY3).
18.
Y. J. Chang, J. E. Chang, C. Y.
Chien, J. C. Hsu, M. T. Hung, S. W. Lee, and P.
W. Li, ¡§Formation of Ge Quantum Dots in
Silicon Oxide and Silicon Nitride Matrices and Associated Optical and Thermal
Properties,¡¨ 2011 Material Research Society Spring meeting, San Francisco, USA.
19. I. H. Chen, K. H. Chen, and P. W. Li, ¡§Single Ge quantum dot placement along with self-aligned electrodes
for effective management of single electron tunneling,¡¨
2011 International Electron Device and Material Symposium, Taipei, Taiwan (NSC
99-2120-M-008-004 and 99-2221-E-008-095-MY3).
20. I. H.
Chen, K. H. Chen, and P. W. Li,
¡§Experimental study of the tunneling spectroscopy of Ge quantum dot single electron transistors with
self-aligned electrode,¡¨ 2011 Silicon Nanoelectronics Workshop, Kyoto, Japan (NSC
99-2120-M-008-004 and 99-2221-E-008-095-MY3).
21. K. H. Chen, I. H. Chen, and P. W. Li, ¡§Enhanced gate
modulation of Ge single electron transistors with
self-aligned electrodes,¡¨ 2011 Silicon Nanoelectronics Workshop, Kyoto, Japan (NSC
99-2120-M-008-004 and 99-2221-E-008-095-MY3).
22. C. Y. Chien,
P. C. Chiu, J. I. Chyi, and P. W. Li, ¡§Influences of gate metal and thermal treatment on electrical and
interfacial properties of Ti/Pt/HfO2/InAs pMOS capacitors,¡¨ 2011 International Electron Device and Material
Symposium, Taipei, Taiwan.
23. C. Y. Chien,
Y. J. Chang, K. H. Chen, W. T. Lai, Tom George, and P. W. Li, ¡§Nanoscale enhanced local oxidation of silicon-nitride layers by ¡§burrowing¡¨ Ge
quantum dots,¡¨ 2011
International Electron Device and Material Symposium, Taipei, Taiwan.
24.
K. H. Chen, I. H. Chen, and P. W. Li, ¡§Internal structure and electrical
roperties of Ge quantum dot
in single-electron transistors,¡¨ 2010 Silicon Nanoelectronics Workshop, Honolulu, Hawaii, USA. (NSC
98-2120-M-008-001).
25.
C. C. Wang, K. H. Chen, C. Y. Chien, and P. W.
Li, ¡§Formation of thin-film-like Ge quantum
dots array in thermally oxidizing SiGe pillar
technique for energy harvest/conversion applications,¡¨
2010 International Conference on Solid-State Devices and Materials, Tokoyo, Japan.
26.
C. C. Wang, K. H. Chen, C. Y. Chien, and P. W.
Li , 2010, ¡§Formation of thin-film-like Ge quantum
dots array in thermally oxidizing SiGe pillar
technique for energy harvest/conversion applications¡¦¡¦
International Electron Device and Material Symposium, Jhong-li,
Taoyuan, Taiwan.(Nov 18-19)-Best student paper award
27.
P. H. Chen, P. Y. Lo, T. Y. Hu, and P. W. Li, ¡§Bias-temperature-instability
and thermal anneal effects of organic thin-film transistors,¡¨ 2010 International Conference on Solid-State Devices and Materials,
28.
C. Y. Chien, Y.
R. Chang, R. N. Chang, M. S. Lee, and P.
W. Li, ¡§Formation of 3D Ge quantum dots array for
advanced photovolatics in layer-cake technique, 2010
IEEE Nanotechnology Conference,
29.
K. H. Chen, I. H. Chen, and P. W. Li, ¡§Effective Ge single electron transistors with precise quantum dot
placement,¡¨, 2010 IEEE Si Nanoelectronics
Workshop, Hawaii, USA.
30.
K. H. Chen, I. H. Chen, and P. W. Li,
¡§Internal
structure and electrical properties of Ge quantum dot
in single-electron transistors,¡¨ 2010 International
Electron Device and Material Symposium, Taoyuan,
Taiwan. (NSC 98-2120-M-008-001).
31.
I. H. Chen, K. H. Chen, H. H. Chou, and P. W. Li, ¡§CMOS-compatible
fabrication of room-temperature Ge QD single hole
transistors,¡¨ 2010 IEEE Si Nanoelectronics
Workshop, Hawaii, USA.
32.
I. H. Chen, K. H. Chen, H. H. Chou, and
P. W. Li, ¡§CMOS-compatible
Fabrication of Room-temperature Ge QD Single Hole
Transistors,¡¨ 2010 International Electron Device and
Material Symposium, Taoyuan, Taiwan. (NSC
98-2120-M-008-001).
33.
I. H. Chen, S. S. Tseng, and P. W. Li, "Thermal
stability of poly-Si phototransistors incorporating Ge
quantum dots for near ultraviolet light detection and amplification," 2009
International Electron Device and Material Symposium,
34.
W. T. Lai, C. W. Wu, C. C. Lin, and P. W. Li, "Transport
Characteristics in Tri-gate Si Nanowire MOSFETs," 2009 International
Electron Device and Material Symposium, Taoyuan,
Taiwan.
35.
K. H. Chen, C. Y. Chien,
W. T. Lai, S. W. Lee, and P. W. Li,
"Positioning and numbering Ge quantum dots for
effective single electron devices," 2009 International Electron Device and
Material Symposium, Taoyuan, Taiwan.
36.
I. H. Chen, S. S. Tseng, and P. W. Li, ¡§Thermal stability of
poly-Si phototransistors incorporating Ge quantum
dots for near ultraviolet applications,¡¨ 2009
International Conference on Solid-State Devices and Materials,
37.
K. H. Chen, C. Y. Chieh,
W. T. Lai, and P. W. Li, ¡§Positioning and numbering
Ge quantum dots for effective quantum electrodynamic devices,¡¨ 2009
International Conference on Solid-State Devices and Materials, Sendai, Japan.
38.
I. H. Chen, S. T. Sheng, and P. W. Li, ¡§Thermal stability of
germanium quantum dots phototransistors for near ultra-violet applications,¡¨ 10th IEEE Si Nanoelectronics
Workshop,
39.
W. T. Lai, C. W. Wu, and P. W. Li, ¡§Temperature-dependent
quantum transport characteristics in Si-nanowire MOSFETs,¡¨ 10th IEEE Si Nanoelectronics
Workshop,
40.
K. H. Chen, C. Y. Chien,
W. T. Lai, S. W. Lee, and P. W. Li
, ¡§Positioning
and numbering Ge quantum dots for effective quantum
tunneling devices,¡¨ 2009 IEEE Nanotechnology Conference, Geneva,
Italy, 2009/July 12-14, 2009.
41.
Wei-Ting Lai, C. C. Chen, David M. T. Kuo, and Pei-Wen Li, 2008, ¡§Tunneling spectroscopy of
germanium quantum-dot in single-hole transistors with self-aligned electrodes,¡¨ 2008 International Conference on Solid-State Devices and Materials,
Japan.
42.
S. S. Tseng, I. H. Chen, and P. W. Li, 2008, ¡§¡§Photoresponses in Poly-Si Phototransistors Incorporating Germanium Quantum Dots in
the Gate Dielectrics,¡¨ IEEE Nanotechnology
43.
W. T. Lai, G. H. Chen, David M. T. Kuo, and P. W. Li,
2008, ¡§Multi-peak Negative Differential Resistance Arising from Tunneling
Current through Few Germanium Quantum Dots,¡¨ IEEE Si Nanoelectronics
44.
S. H. Hsu, L. Y. Yang, and P. W. Li, 2008, ¡§Low Power
Enhanced Charge Retention of Nanocrystal
Metal-oxide-semiconductor Capacitors with Multi-stack Germanium Quantum Dots¡¨, 2008 the 4th
International Silicon Germanium Device and Technology Meeting,
45.
S. H. Hsu, W. T. Lai, and P. W. Li, 2007, ¡§Suppression of
gate-induced tunneling barrier lowering on Germanium Quantum-dot Single-hole
Transistors with Self-aligned Electrodes,¡¨ 2007
International Electron Device and Material Symposium.
46.
S. Tseng and P. W. Li, 2007, ¡§Photoresponse enhancement of eetal-Oxide-Semiconductor photodetector with multi-stack germanium quantum dots
embedded in oxide,¡¨ 2007 International Electron Device
and Material Symposium,
47.
G. L. Chen, W. T. Lai, and P. W. Li, 2007, ¡§Large Coulomb-blockade
Oscillations on Germanium Quantum-dot Single-hole Transistor,¡¨ 2007 International Electron Device and Material Symposium,
48.
S. Tseng and P. W. Li, 2007, ¡§Photoresponse enhancement of metal-oxide-semiconductor near ultraviolet photodetector with multi-stack germanium quantum dots
embedded in oxide,¡¨ oral presentation in 2007
International Conference on Solid-State Devices and Materials,
49.
W. T. Lai and P. W. Li, 2007, ¡§Transient Behavior of
Germanium Quantum-dot Resonant Tunneling Diode,¡¨ oral
presentation in to 2007 International Conference on Solid-State Devices and
Materials, Japan.
50.
S. H. Hsu, W. T. Lai, and P. W. Li, ¡§High performance
Germanium Quantum-dot Single-hole Transistors with Self-aligned Electrodes,¡¨ oral presentation in 2007 International Conference on Solid-State
Devices and Materials,
51. G. L. Chen, W. T. Lai, M. T. Kuo, and P. W. Li,
2007, ¡§Room-temperature Observation of Large Coulomb-blockade Oscillations
from Germanium Quantum-dot Single-hole Transistors with Self-aligned
Electrodes,¡¨ oral presentation in 2007 IEEE
Nanotechnology Conference, Hong Kong.
52. S. Maikap,
P. J. Tzeng, S. S. Tseng, T.-Y. Wang, C. H. Lin, H.
Y. Lee, C. C. Wang, T. C. Tien, L. S. Lee, P. W.
Li, J.-R. Yang, M.-J. Tsai, 2007, ¡§High-K HfO2/TiO2/HfO2
multilayer quantum well flash memory devices,¡¨ 2007 International Symposium on
VLSI Technology, Systems and Applications, VLSI-TSA. (EI)
53.
54. S.
Maikap, P. Tzeng, S. Tseng, C. Lin, H. Lee, C. Wang, L. Lee, T. Tien, S. Lo, P. W. Li, M. Tsai, 2006, ¡§High density and uniform
ALD TiN nanocrystal flash
memory devices with large memory window and good retention,¡¨ 2006 International Electron Device and Material Symposium (Best
Paper)
55. W.
T. Lai and P. W. Li, 2006, ¡§Fabrication
of Ge quantum-dots by oxidation of Si1-xGex-on-insulator
nanowires and its applications to resonant tunneling diodes and
single-electron/-hole Transistors,¡¨ oral presentation in
2006 International Conference on Solid-State Devices and Materials, Yokohama,
Japan.
56. S.
Maikap, P. Tzeng, S. Tseng, C. Lin, H. Lee, C. Wang, L. Lee, T. Tien, S. Lo, P. W. Li, M. Tsai, ¡§High density and uniform ALD TiN nanocrystal flash memory devices
with large memory window and good retention,¡§ oral
presentation in 2006 International Conference on
Solid-State Devices and Materials, Yokohama, Japan.
57. Y.
C. Hsu, P. W. Li, and David
M. T. Kuo, 2006, ¡§Room temperature observation of
current bistability and find structures in germanium quantum dits/SiO2
resonant tunne
58. R.
H. Wu and P. W. Li, 2006, ¡§Ge nanocrystal Metal-oxide-semiconductor capacitors formed by
oxidation of poly-Si0.88Ge
59.
W. T. Lai, P. W. Li, and David M. T. Kuo,
2006, ¡§Room-temperature steady-state
and transient carrier transport properties of Germanium single electron/hole
transistors,¡¨ presentation in the 3rd
International Silicon Germanium Device and Technology Meeting, Princeton, USA.
(EI)
60. S.
S. Tseng, W. T. Lai, and P. W. Li,
2006, ¡§Metal-insulator-metal photodetectors
with Ge quantum dots formed by selective oxidation of
single crystal
61. C.
H. Huang, C. L. Chang, Y. Y. Yang, T. Suryasindhu, W. C. Liao, Y. H. Su, P. W. Li, C. Y. Liu, C. S. Lai,
J. H. Ting, C. S. Chu, and T. H. Lee, 2006, ¡§Nanothick Layer Transfer of Huydrogen-implanted Wafer Using
Polysilicon Sacrificial Layer,¡¨ presented in 2006 Material Research
Symposium Spring Meeting, San Francisco, USA.
62. P. W. Li,
2006, ¡§Physical Properties of Ge Quantum Dots and Room-Temperature Ge
Single-electron/hole Transistors¡¨, invited talk, Symposium on Nano Device Technology,
63. P. W. Li,
2006, ¡§Ge Quantum Dots Transistors,¡¨ invited talk, presented at the annual meeting of the Physics
Society,
64. W.
T. Lai, W. M. Laio, P. W. Li
and M. T. Kuo, 2005, ¡§Effects of Parasitic MOSFETs and Traps on
Charge Transport Properties of Germanium Quantum Dot Single Electron/Hole
Transistors,¡¨ oral presentation in 2005 IEEE International Conference on
Electronic Devices and Solid-State Circuits, HongKong.
(EI)
65. W.
M. Liao, W. T. Lai, P. W. Li,
M. T. Kuo, P. S. Chen, and M. ¡VJ. Tsai, 2005, ¡§Strong Quantum Confinement and Coulomb Blockade Effects in Ge
Quantum Dots/SiO2 system,¡¨ Proceeding of 5th
IEEE Nanotechnology Conference, Nagoya, Japan.
66. W.
M. Liao, C. F. Shih, and P. W. Li,
2005, ¡§Thermal Sensitivity of SiGe
Dynamic Threshold pMOSFETs,¡¨ 12th
International Symposium on the Physical and Failure Analysis of Integrated
Circuits (IPFA), Singapore.
67. W. T. Lai, W. M. Liao, M. T. Kuo, and P. W. Li,
2005, ¡§Quantum Confinement Effects on the Electronic Structure of Ge Quantum-Dots Formed by Selective Oxidation of SiGe-on-Insulator,¡¨ present in the
International Conference on Silicon Epitaxy and Heterostructures,
68. M.
T. Kuo and P. W. Li, 2005, ¡§Single Electron Transistor at High Temperature,¡¨ presented in the 2005 American Physics Spring Meeting,
69. P. W. Li,
W. M. Liao, M. T. Kuo, and W. T. Lai, 2005, ¡§Optical and Electronics Characteristics of Germanium Quantum Dots
Formed by Selective Oxidation of SiGe/Si-on-Insulator,¡¨
presented in the 2005 American Physics Society Spring Meeting,
70. P. W. Li
W. M. Liao, W. T. Lai, M. T. Kuo and M. ¡VJ. Tsai, 2005, ¡§Germanium Quantum-Dots Formed by Selective Oxidation of SiGe and Room-Temperature Ge Single-Electron
Transistors,¡¨ presented in 2005 US Air Force/Taiwan Nanoscience Initiative Workshop,
71. S.
S. Tseng, P. W. Li, W. M.
Liao, and W. T. Lai, ¡§Photoluminesence of Ge
nanocrystals formed by oxidation of polycrystalline-Si0.8Ge
72. W.
T. Lai, P. W. Li, W. M. Liao,
and S. S. Tseng, ¡§Growth mechanism of Ge Quantum
Dots Formed by Selective Oxidation of Si1-xGex-on
insulator,¡¨ presented in 2005 Electron
Devices and Materials Symposia,
73. W.
M. Liao, C. F. Shih, W. T. Lai, and P.
W. Li, ¡§Study of SiGe
Dynamic Threshold pMOSFET at Various Temperature,¡¨ presented in 2004
International Electron Devices and
Materials Symposia,
74. W.
M. Liao, P. W. Li, M. T. Kuo,
P. S.
Chen, and M. ¡VJ. Tsai, ¡§Electrical and Optical properties
of Ge Quantum-dots Formed by Selective Oxidation of SiGe-on-Insulator and Room-Temperature Ge
Single-Electron Transistors,¡¨ presented in the 2nd International SiGe Technology
and Device Meeting, Frankfurd, Germany, 2004.
75. P. W. Li, W. M. Liao, P. S. Chen, S. C. Lu, and M. ¡VJ. Tsai, ¡§Fabrication and Characterization of Ge
Quantum-dot Transistor Formed by Selective Oxidation of SiGe/Si-on-Insulator,¡¨ presented in 2004 Material Research Symposium Spring Meeting.
76. W. M. Liao, P. W. Li, M. T. Kuo, P. S.
Chen, and M. -J. Tsai, ¡§Electrical
and Optical Properties of Ge Quantum-Dots Formed by Selective Oxidation of
SiGe-on-Insulator and Room-Temperature Ge Single-Electron Transistors¡¨, presented in Symposium on Nano Device Technology 2004.
77. W. M. Liao, P. W. Li, S. W. Lin and W. C.
Tsai, ¡§Fabrication of atomic-scale germanium quantum-dot single-electron
transistor,¡¨ presented in 2003 Electronics Device and
Material Symposium,
78. C. P. Tseng, P. W. Li, and W. M. Liao, ¡§SiGe pMOSFETs for Micropower
Applications,¡¨ presented in 2003 Electronics Device and
Material Symposium,
79. S. S. Tzeng,
P. W. Li, and W. M. Liao, ¡§Study of NiSi and Ni(Si0.8Ge0.2)
formed at low silicidation temperature,¡¨ presented in 2003
Electronics Device and Material Symposium,
80. S. W. Lin, W. M. Liao, and P. W. Li, ¡§Formation of nano-scale of Ge Quantum Dots by Selecive
Oxidation of SiGe on SOI,¡¨ presented in 2003 Electronics
Device and Material Symposium,
81. W.
C. Tsai, C. C. Shih, and P. W. Li, ¡§Study of Strained SiGe-channel n- and
p-MOSFETs,¡¨ presented
in 2003 Electronics Device and Material Symposium,
82. P. W. Li, W. M. Liao, S. W. Li, P. S. Chen, S. C.
Lu, and M. ¡VJ. Tsai, ¡§Formation of Ge
Quantum Dots by Selective Oxidation of SiGe Alloys
for Single-Electron Devices,¡¨ presented in 2003
International Conference on Solid State Devices and Materials, Tokyo, Japan
83. P. W. Li,
W. M., Liao, C. C.
Shih, T. S. Kuo, L. S. Lai,
Y. T. Tseng, and M. ¡VJ. Tsai, 2003, ¡§High Performance Si/SiGe
Heterostructure MOSFETs for Low power and Low Noise
RF/Microwave Circuit Applications,¡¨ presented in the
1st International SiGe Technology and Device Meeting,
Nagoya, Japan, 2003.
84. Fu-Li Hsiao, Chii-Chang Chen, Pei-Wen Li, and Jenq-Yang
Chang, 2003, ¡§Novel Structure of Variable
Optical Attenuator on SOI,¡¨ 2003 OPT.
85.
P. W. Li, W. M. Liao, and C. C. Shih,
2002, ¡§SiGe Heterostructure
MOSFETs for Micropower Circuits Applications¡¨, presented in 2002
International Electron Devices and Materials Symposia,
86. Y. M. Hsin,
H. T. Hsu, K. P. Hseuh, W. B. Tang, P. W. Li, and N. Y. Li, 2002, ¡§Effects of annealing on the performance of InGaP/InGaAsN/GaAs HBTs,¡¨
presented in 2002 International Electron Devices and
Materials Symposia,
87. Y. C. Chen, C. C. Chen, C. C.
Shih, P. W. Li, and J. Y.
Chang, ¡§Design and Fabrication of SOI-based AWG,¡¨
presented in OPT 2002.
88. C. C. Shih, P. W.Li,
C. C. Chen, and J. Y. Chang, 2002, ¡§Vertical Si Rib Structure Formed by SF6/C
89. P. W. Li, and W. M. Liao, 2002, ¡§Low-frequency noise
analysis of Si/SiGe pMOSFETs
for RF circuits¡¨, presented in 2002 International
Conference on Solid State Devices and Materials, Nagoya, Japan.
90.
Y. S. Huang, C.
J. Lin, N. Y. Li and P. W. Li, 2002, ¡§Photoreflectance and surface photovoltage spectroscopy characterization of an InGaP/InGaAsN/GaAs
NpN double-heterojunction
bipolar transistor structure¡¨, 2002 Diluted Nitride Workshop, Istanbul, Turkey, Sep. 2002.
91. P. W. Li and W. M. Liao, 2001, ¡§Design of High Speed Si/SiGe Heterojunction Complementary
MOSFETs with Reduced Short-Channel Effects,¡¨ presented
in Tenth Canadian Semiconductor Technology Conference,
92. W. M. Liao and P. W. Li, 2001, ¡§High performance pMOSFETs with Reduced Short Channel Effects using SiGe Source/Drain Heterojunction¡¨, presented in 2001 Electronic Device & Material Symposium.
93. P. W. Li, H. L. Chen, and S. B. Su, 2001, ¡§SiGe pMOS Devices with Gate Dielectrics Formed
by LPCVD TEOS Oxide¡¨, presented in Symposium on Nano
Device Technology 2001.
94. J. S. Liang, Y. S. Huang, C.
W. Tien, Y. M. Chang, C. W. Chen, N. Y. Li, P. W. Li, and F. H. Pollak, 2001, ¡§Angle dependent surface photovoltage spectroscopy study of GaAs/GaAlAs vertical cavity surface emitting laser structures,¡¨ 43rd 2001 Electronic Materials Conference, University of Notre
Dame, Notre Dame, Indiana, USA
95. P. W. Li, H. R. Chen, and W. M. Liao, 2000, ¡§Analytical Modeling of
Si/SiGe Complementary MOS Transistors¡¨, in the Proceeding of 2000 Electronic Device & Material
Symposium.
96. P. W. Li, H. C. Guang, and
N. Y. Li, 2000 ¡§Characterization of the Optical Properties of InxGa1-xAs1-yNy
by Variable Angle Spectroscopic Ellipsometry¡¨, in the Proceeding of 2000 Electronic Device & Material
Symposium.
97. P. W. Li, N. Y. Li, and
H. C. Guang, 1999, ¡§Characterization of the
Index of Refraction of GaAs1-xNx by Ellipsometry,¡¨ in the Proceeding of 1999 Electronic Device & Material
Symposium, p.289-292
98.
N. Li, C. P. Hains,
K. Yang, J. Cheng, P. W. Li,
M. Moorthy, X. Weng, R. S.
Goldman, 1999, ¡§OMVPE Growth and Characteristics of Almost 1.2 mm GaInNAs-GaAs Three-Quantum-Well Laser Diode¡¨, presented in the 9th International OMVPE Conference.
99.
P.
W. Li, 1998, Characterization and Simulation of the
Physical Properties of Si1-xGex Oxide, presented in 1998
International conference on Next decades of High Technologies.
100.
S.
101.
P.
W. Li, E. S. Yang, Y. F. Yang, and X. Li, 1994,
Eletron Cyclotron Resonance Microwave Plasma Enhanced SiGe Oxidation and MOS
Transistors, presented in the 21st International Symposium on
Compound Semiconductor,
102.
P. W. Li, Z. Lu, U. Gennser,
E. S. Yang and R. M. Osgood, Jr., 1991, "Oxidation of SiGe
by Electron Cyclotron Resonance Plasma," presented in Material Research
Society 1991 Fall meeting.
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